Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition - IN2P3 - Institut national de physique nucléaire et de physique des particules
Journal Articles Thin Solid Films Year : 2010

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis
  • Function : Author
E. Fourmond
N. Bererd
  • Function : Author
ACE
M. Lemiti

Abstract

1 Corresponding author.

Domains

Radiochemistry
Fichier principal
Vignette du fichier
J.Dupuis - Optical and structural properties of silicon oxynitride-avec figure.pdf (1.06 Mo) Télécharger le fichier
Origin Files produced by the author(s)
Loading...

Dates and versions

in2p3-00734027 , version 1 (10-01-2019)

Identifiers

Cite

J. Dupuis, E. Fourmond, D. Ballutaud, N. Bererd, M. Lemiti. Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition. Thin Solid Films, 2010, 519, pp.1325-1333. ⟨10.1016/j.tsf.2010.09.036⟩. ⟨in2p3-00734027⟩
23 View
0 Download

Altmetric

Share

More