Journal Articles
Applied Physics
Year : 1979
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https://in2p3.hal.science/in2p3-00019490
Submitted on : Thursday, May 31, 2001-2:16:18 PM
Last modification on : Thursday, April 11, 2024-1:18:11 PM
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- HAL Id : in2p3-00019490 , version 1
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R.O. Bell, M. Toulemonde, P. Siffert. Calculated temperature distribution during laser annealing in silicon and cadmium telluride. Applied Physics, 1979, 19, pp.313-319. ⟨in2p3-00019490⟩
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