Origin of the heat load on a substrate coated in inverted cylindrical magnetron (ICM) - IN2P3 - Institut national de physique nucléaire et de physique des particules
Conference Papers Year : 2015

Origin of the heat load on a substrate coated in inverted cylindrical magnetron (ICM)

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Plasma Physics [physics.plasm-ph]

Emmanuelle Vernay  : Connect in order to contact the contributor

https://in2p3.hal.science/in2p3-01245399

Submitted on : Thursday, December 17, 2015-10:35:31 AM

Last modification on : Wednesday, September 18, 2024-12:12:03 PM

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in2p3-01245399 , version 1 (17-12-2015)

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  • HAL Id : in2p3-01245399 , version 1

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T. Le Coz, M. Mantel, C. Vachey, A. Todoran, A. Bès, et al.. Origin of the heat load on a substrate coated in inverted cylindrical magnetron (ICM). 4th Magneton, Ion Processing & Arc Technologies European Conference, 14th Internation Symposium on Reactive Sputter Deposition (MIATEC 2015), Dec 2015, Paris, France. ⟨in2p3-01245399⟩

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