Journal Articles
Plasma Processes and Polymers
Year : 2014
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https://in2p3.hal.science/in2p3-01094299
Submitted on : Friday, December 12, 2014-9:24:24 AM
Last modification on : Wednesday, December 18, 2024-10:12:03 AM
Cite
C. Vandenabeele, R. Maurau, S. Bulou, F. Siffer, M. Gérard, et al.. Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration. Plasma Processes and Polymers, 2014, 11 (11), pp.1089-1101. ⟨10.1002/ppap.201400098⟩. ⟨in2p3-01094299⟩
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