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Conference Papers Year : 2011

Nanometric Bubble Formation in SiO2 by Ion Implantation: Influence of the Substrate

E. Oliviero
B. Décamps
M.-O. Ruault
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in2p3-00703743 , version 1 (04-06-2012)

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  • HAL Id : in2p3-00703743 , version 1

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E. Oliviero, B. Décamps, M.-O. Ruault. Nanometric Bubble Formation in SiO2 by Ion Implantation: Influence of the Substrate. Indo-French conference on Nano-Structuring by Ion Beams, 2009, Bhubaneswar, India. pp.173-180. ⟨in2p3-00703743⟩
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