Journal Articles
Applied Surface Science
Year : 1989
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https://in2p3.hal.science/in2p3-00018827
Submitted on : Tuesday, January 23, 2001-8:18:02 AM
Last modification on : Thursday, April 11, 2024-1:18:11 PM
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- HAL Id : in2p3-00018827 , version 1
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E. Boch, C. Fuchs, E. Fogarassy, P. Siffert. Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. Applied Surface Science, 1989, 43, pp.17-22. ⟨in2p3-00018827⟩
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