Journal Articles
Radiation Effects
Year : 1971
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https://in2p3.hal.science/in2p3-00018479
Submitted on : Friday, December 22, 2000-9:45:54 AM
Last modification on : Thursday, April 11, 2024-1:18:11 PM
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- HAL Id : in2p3-00018479 , version 1
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P. Sebillotte, M. Badanoiu, V.B. Ndocko-Ndongue, P. Siffert. Low energy boron implantation profiles in silicon from junction depth measurements. Radiation Effects, 1971, 7, pp.7-15. ⟨in2p3-00018479⟩
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