Journal Articles Journal of Applied Physics Year : 1988

On the kinetics of solid phase regrowth and dopant activation during rapid thermal annealing of implantation amorphized silicon

W.O. Adekoya
  • Function : Author
J.C. Muller
  • Function : Author
No file

Dates and versions

in2p3-00017459 , version 1 (26-09-2000)

Identifiers

  • HAL Id : in2p3-00017459 , version 1

Cite

W.O. Adekoya, M. Hage-Ali, J.C. Muller, P. Siffert. On the kinetics of solid phase regrowth and dopant activation during rapid thermal annealing of implantation amorphized silicon. Journal of Applied Physics, 1988, 64, pp.666. ⟨in2p3-00017459⟩
1 View
0 Download

Share

More