Synthesis of SiO$_2$ thin films by reactive excimer laser ablation - IN2P3 - Institut national de physique nucléaire et de physique des particules
Journal Articles Applied Surface Science Year : 1992

Synthesis of SiO$_2$ thin films by reactive excimer laser ablation

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in2p3-00016023 , version 1 (06-06-2000)

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  • HAL Id : in2p3-00016023 , version 1

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E. Fogarassy, A. Slaoui, C. Fuchs, J.P. Stoquert. Synthesis of SiO$_2$ thin films by reactive excimer laser ablation. Applied Surface Science, 1992, 54, pp.180-186. ⟨in2p3-00016023⟩
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