Journal Articles
Journal of Vacuum Science & Technology A
Year : 2003
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https://in2p3.hal.science/in2p3-00013943
Submitted on : Thursday, August 21, 2003-11:31:45 AM
Last modification on : Thursday, April 11, 2024-1:18:11 PM
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- HAL Id : in2p3-00013943 , version 1
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A. Barranco, J. Cotrino, F. Yubero, T. Girardeau, S. Camelio, et al.. Plasma-enhanced chemical vapor deposition of SiO$_2$ from a Si(CH$_3)_3$Cl precursor and mixtures Ar/O$_2$ as plasma gas. Journal of Vacuum Science & Technology A, 2003, 21, pp.900-905. ⟨in2p3-00013943⟩
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