Hydrogen depth profile in sputtered Cu$_x$Zr$_{1-x}$ amorphous alloys studied by nuclear reaction analysis evolution as a function of annealing temperature - IN2P3 - Institut national de physique nucléaire et de physique des particules
Journal Articles Solid State Communications Year : 1986

Hydrogen depth profile in sputtered Cu$_x$Zr$_{1-x}$ amorphous alloys studied by nuclear reaction analysis evolution as a function of annealing temperature

M. Fallavier
  • Function : Author
Institut de Physique Nucléaire de Lyon
J.-P. Thomas
  • Function : Author
Institut de Physique Nucléaire de Lyon
J.M. Frigerio
  • Function : Author
J. Rivory
  • Function : Author

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https://in2p3.hal.science/in2p3-00004091

Submitted on : Friday, March 10, 2000-8:43:33 AM

Last modification on : Thursday, April 11, 2024-1:18:11 PM

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in2p3-00004091 , version 1 (10-03-2000)

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  • HAL Id : in2p3-00004091 , version 1

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M. Fallavier, J.-P. Thomas, J.M. Frigerio, J. Rivory. Hydrogen depth profile in sputtered Cu$_x$Zr$_{1-x}$ amorphous alloys studied by nuclear reaction analysis evolution as a function of annealing temperature. Solid State Communications, 1986, 57, pp.59-61. ⟨in2p3-00004091⟩

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